首页> 外国专利> Method for aligned application of silicon chips with switching structures on e.g. wafer substrate, involves fixing aligned components on substrate by electrostatic force by applying electrical holding voltage above metallization surfaces

Method for aligned application of silicon chips with switching structures on e.g. wafer substrate, involves fixing aligned components on substrate by electrostatic force by applying electrical holding voltage above metallization surfaces

机译:对准施加具有例如开关结构的硅芯片的方法晶片基板,涉及通过在金属化表面上方施加电保持电压,通过静电力将对齐的组件固定在基板上

摘要

The method involves providing a carrier substrate with metallization surfaces i.e. pads, having hydrophilic or lipophilic characteristics, where areas surrounding the surfaces are hydrophobic or lipophobic. Components are applied on fluid assembling medium i.e. conductive adhesive, provided at the surfaces. The components are held at a surface of the medium based on surface tension of the medium to align the components above the surfaces. The aligned components are fixed on the substrate by electrostatic force by applying electrical holding voltage above the surfaces of the substrate. An independent claim is also included for a method for manufacturing a carrier substrate with metallization surfaces.
机译:该方法包括提供具有金属化表面的载体衬底,即具有亲水或亲脂特性的垫,其中围绕表面的区域是疏水的或疏脂的。将部件施加在设置在表面上的流体组装介质上,即导电粘合剂上。基于介质的表面张力将组件保持在介质的表面,以使组件在表面上方对齐。通过在基板表面上方施加电保持电压,通过静电力将对准的组件固定在基板上。还包括用于制造具有金属化表面的载体衬底的方法的独立权利要求。

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