Hollow cathode - plasma source as well as the use of the hollow cathode - plasma source

摘要

The invention relates to a hollow cathode - plasma source as well as the use of the hollow cathode - plasma source. The device according to the invention is based on the basis of the hollow cathode - effect, in particular, it is to the gas flow sputtering for the coating of articles by means of physical vapor deposition in the vacuum. In this case, the invention relates in particular to the type and manner of the outer electrical insulation of the cathode and the remaining components, which lead the same electric potential.