ELECTRON BEAM EXPOSURE DEVICE, ELECTRON BEAM EXPOSURE METHOD, ORIGINAL PLATE AND METHOD FOR PRODUCING THE SAME, AND WORKING MOLD AND METHOD FOR PRODUCING THE SAME

摘要

PROBLEM TO BE SOLVED: To suppress occurrence of error attributable to the resolution of a detector.;SOLUTION: A device includes: resolution input means for inputting a resolution of a detector separately used for detecting information of a data region and a servo signal of a servo region on a magnetic recording medium; exposure position candidate determination means for determining a candidate α, β of exposure positions by setting, on a substrate 4, a distance multiplied by a natural number of the resolution input by the resolution input means, the distance between a candidate α, β of a certain exposure position and a candidate α, β of another exposure position; movement means for moving an irradiation position of an electron beam relatively to the substrate 4; and exposure means for optically exposing with a form corresponding to a servo pattern and to a data pattern. Further, the exposure is performed only on a candidate of a certain exposure position determined by the exposure position candidate determination means by using the exposure means while the substrate 4 is moved by the movement means, and/or the exposure is performed continuously from the candidate α, β of a certain exposure position as starting point and the candidate α, β of another exposure position as ending point.;COPYRIGHT: (C)2012,JPO&INPIT