首页> 外国专利> For hard disk substrate polishing liquid composition, as well as polishing method and method of manufacturing the hard disk substrate using the same

For hard disk substrate polishing liquid composition, as well as polishing method and method of manufacturing the hard disk substrate using the same

机译:用于硬盘基板抛光液组合物,以及抛光方法和使用该方法制造硬盘基板的方法

摘要

PROBLEM TO BE SOLVED: To provide a polishing liquid composition for a hard disk substrate, with which alumina abrasive grains can be prevented from piercing into a substrate without impairing productivity.;SOLUTION: In the polishing liquid composition for the hard disk substrate containing an α-alumina and water, the α-alumina has 20 to 70% α-crystallinity, ≥0.23° half width of a peak in 35.1 to 35.3° diffraction angle 2θ region derived from a surface 104 of the α-alumina in an X-ray diffraction spectrum of the α-alumina, 10 to 40 m2/g specific surface area of the α-alumina and 0.1 to 0.5 μm average particle diameter.;COPYRIGHT: (C)2009,JPO&INPIT
机译:解决的问题:提供一种用于硬盘基板的抛光液组合物,通过该抛光液组合物可以防止氧化铝磨粒刺入基板而不会损害生产率。解决方案:在包含α的硬盘基板用抛光液组合物中α-氧化铝和水,α-氧化铝具有20-70%的α-结晶度,≥0.23°。在35.1至35.3°中的峰的半峰宽为2。衍射角2θ在α-氧化铝的X射线衍射光谱中由α-氧化铝的表面104衍生的区域,α-氧化铝的比表面积为10至40m 2 / g,并且平均粒径0.1至0.5μm.;版权所有(C)2009,JPO&INPIT

著录项

  • 公开/公告号JP5063339B2

    专利类型

  • 公开/公告日2012-10-31

    原文格式PDF

  • 申请/专利权人 花王株式会社;

    申请/专利号JP20070341297

  • 发明设计人 鈴木 誠;末永 憲一;

    申请日2007-12-28

  • 分类号G11B5/84;B24B37/00;C09K3/14;

  • 国家 JP

  • 入库时间 2022-08-21 17:39:34

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