首页> 外国专利> STRUCTURE RESULTING FROM CHEMICAL SHRINK PROCESS OVER BARC (BOTTOM ANTI-REFLECTIVE COATING)

STRUCTURE RESULTING FROM CHEMICAL SHRINK PROCESS OVER BARC (BOTTOM ANTI-REFLECTIVE COATING)

机译:BARC(底部抗反射涂层)上的化学收缩过程产生的结构

摘要

A structure. The structure includes: a hole layer; a hole layer including a top hole layer surface, wherein the hole layer has a thickness in a first direction that is perpendicular to the hole layer surface; a bottom antireflective coating (BARC) layer on and in direct physical contact with the hole layer at the top hole layer surface; a photoresist layer on and in direct physical contact with the BARC layer, wherein a continuous hole in the first direction extends completely through the photoresist layer, the BARC layer, and the hole layer; and a polymerized hole shrinking region in direct physical contact with the photoresist layer at a lateral surface of the photoresist layer and with the hole layer at the top hole layer surface, wherein the hole shrinking region does not extend below the hole layer surface in a direction from the BARC layer to the hole layer.
机译:一种结构。该结构包括:孔层;孔层,其包括顶孔层表面,其中所述孔层在垂直于所述孔层表面的第一方向上具有厚度;在该孔层的顶部孔层表面上并与该孔层直接物理接触的底部抗反射涂层(BARC);在BARC层上并与BARC层直接物理接触的光致抗蚀剂层,其中在第一方向上的连续孔完全延伸穿过光致抗蚀剂层,BARC层和孔层;聚合的空穴收缩区域,在光致抗蚀剂层的侧面与光致抗蚀剂层直接物理接触,并且在顶孔层表面与孔层直接物理接触,其中,该空穴收缩区域不在孔层表面以下的方向上延伸从BARC层到空穴层。

著录项

相似文献

  • 专利
  • 外文文献
  • 中文文献
获取专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号