首页> 外国专利> LOW-REFLECTIVE FILM, METHOD FOR FORMATION THEREOF AND LOW-REFLECTIVE MEMBER EQUIPPED THEREWITH, AND COATING SOLUTION FOR FORMATION OF LOW-REFLECTIVE FILM, METHOD FOR PREPARATION THEREOF AND LOW-REFLECTIVE MEMBER EQUIPPED THEREWITH

LOW-REFLECTIVE FILM, METHOD FOR FORMATION THEREOF AND LOW-REFLECTIVE MEMBER EQUIPPED THEREWITH, AND COATING SOLUTION FOR FORMATION OF LOW-REFLECTIVE FILM, METHOD FOR PREPARATION THEREOF AND LOW-REFLECTIVE MEMBER EQUIPPED THEREWITH

机译:低反射膜,形成其的方法和配备有低反射性构件的方法,以及低反射膜的形成方法,其制备方法和使用了低反射性构件的方法

摘要

[Problem] To provide a low-reflective film to be formed on a transparent base material and a method for forming the low-reflective film. Specifically, to provide a low-reflective film which can have a low refractive index and a low reflectance when prepared in the form of a single-layered film and can be formed so as to have a large surface area in a simpler manner, a method for forming the low-reflective film, and a low-reflective member equipped with the low-reflective film. [Solution] A low-reflective film and a process for producing the low-reflective film, said low-reflective film characterised by comprising silica microparticles and at least one metal oxide selected from a group consisting of tungsten oxide, niobium oxide, tantalum oxide, titanium oxide, zirconium oxide, tin oxide, aluminum oxide, hafnium oxide, chromium oxide, cerium oxide, molybdenum oxide and lanthanum oxide as a binder in an amount of 5 to 40 mass% inclusive relative to the amount of the silica microparticles, and by having a refractive index of 1.20 to 1.40 inclusive.
机译:[问题]提供一种将在透明基材上形成的低反射膜及其形成方法。具体地,提供一种低反射膜,该低反射膜以单层膜的形式制备时可以具有低折射率和低反射率,并且可以以简单的方式形成为具有大的表面积。用于形成低反射膜的元件;以及配备有该低反射膜的低反射构件。 [解决方案]低反射膜及其制造方法,其特征在于,该低反射膜包含二氧化硅微粒和选自由氧化钨,氧化铌,氧化钽构成的组中的至少一种金属氧化物。相对于二氧化硅微粒的量,氧化钛,氧化锆,氧化锡,氧化铝,氧化ha,氧化铬,氧化铈,氧化钼和氧化镧作为粘合剂的含量为5质量%至40质量%,并且折射率为1.20至1.40(含)。

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