首页> 外国专利> METHOD AND SYSTEM FOR EXPOSING ALIGNMENT FILM FOR LIQUID CRYSTAL, AND LIQUID CRYSTAL PANEL MANUFACTURED USING SYSTEM FOR EXPOSING ALIGNMENT FILM FOR LIQUID CRYSTAL

METHOD AND SYSTEM FOR EXPOSING ALIGNMENT FILM FOR LIQUID CRYSTAL, AND LIQUID CRYSTAL PANEL MANUFACTURED USING SYSTEM FOR EXPOSING ALIGNMENT FILM FOR LIQUID CRYSTAL

机译:液体晶体的曝光膜的方法和系统,以及使用液体晶体的曝光膜的系统制造的液晶面板

摘要

Provided are a method and a system for exposing an optical alignment film, whereby high-speed response of liquid crystal is made possible. In the system for exposing an alignment film for liquid crystal, said system being provided with a liquid crystal alignment film exposure apparatus and a substrate rotating means, the liquid crystal alignment film exposure apparatus is configured by being provided with: a stage means; a first exposure light irradiation means, which radiates, from the first tilted direction, first exposure light to a first predetermined region on a substrate; a second exposure light irradiation means, which radiates, from the second tilted direction, second exposure light to a second predetermined region on the substrate; a stage position measuring means, which measures the position of a stage; and a control means which controls, on the basis of the stage position information obtained by the measurement performed by the stage position measuring means, switching between turning on and turning off of the first exposure light irradiation performed by the first exposure light irradiation means, and the second exposure light irradiation performed by the second exposure light irradiation means.
机译:提供一种用于曝光光学取向膜的方法和系统,从而使得液晶的高速响应成为可能。在用于液晶的取向膜曝光系统中,该系统包括液晶取向膜曝光设备和基板旋转装置,该液晶取向膜曝光设备通过设置台架装置;和第一曝光光照射装置,其从第一倾斜方向向基板上的第一预定区域照射第一曝光光。第二曝光光照射装置,其从第二倾斜方向向基板上的第二预定区域照射第二曝光光。载物台位置测量装置,其测量载物台的位置;控制装置,其基于通过载物台位置测量装置进行的测量而获得的载物台位置信息,在由第一曝光光照射装置进行的第一曝光光照射的接通与断开之间进行切换,并且由第二曝光光照射装置执行的第二曝光光照射。

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