COMPOUND USEABLE AS RESIST PROTECTIVE FILM COMPOSITION FOR REDUCING GENERATION OF DEFECTS IN IMMERSION OR DRY-EXPOSURE PROCESS, POLYMER COMPRISING THE SAME, AND RESIST PROTECTIVE FILM COMPOSITION

摘要

PURPOSE: A compound is provided to have sufficient optical permeability, to make intermixing with a resist membrane difficult, to have proper hydrophilic or hydrophobic properties, to prevent pattern layout degradation, and to easily dissolve into an alkali developer.;CONSTITUTION: A compound is in chemical formula 1. In the chemical formula 1, R11 is one compound selected from the group consisting of hydrogen, halogen, C1-8 alkyl group and C1-5 halogenated alkyl group, R1 is one compound selected from the group consisting of an alkyl group, heteroalkyl group, aryl group, heteroaryl group, cycloalkyl group, heterocycloalkyl group alkylether group and akylcarbonyl group, R2 is one compound selected from the group consisting of hydrogen and a C1-5 alkyl group, and Q1 or Q2 is one compound selected from the group consisting of hydrogen and halogen, respectively and independently.;COPYRIGHT KIPO 2012