首页> 外国专利> Method for reducing gas load of substrate carriers with vacuum processes, comprises repeatedly equipping substrate carrier with a substrate, transferring and treating substrate in vacuum treatment plant, removing and recycling substrate

Method for reducing gas load of substrate carriers with vacuum processes, comprises repeatedly equipping substrate carrier with a substrate, transferring and treating substrate in vacuum treatment plant, removing and recycling substrate

机译:通过真空工艺降低基板载体的气体负荷的方法,包括重复地向基板载体装备基板,在真空处理厂中传输和处理基板,移除和回收基板

摘要

Method for reducing gas load of substrate carriers with vacuum processes, comprises repeatedly equipping a substrate carrier with at least one substrate, transferring into a vacuum treatment plant, treating the substrate in the vacuum treatment plant, removing the substrate carriers from the vacuum treatment plant, recycling the substrate, where the substrate carrier is conducted and/or heated during the recycle by a medium preventing the gas uptake.
机译:通过真空工艺降低基板载体的气体负荷的方法,包括重复地给基板载体配备至少一种基板,转移到真空处理设备中,在真空处理设备中处理基板,从真空处理设备中移除基板载体,回收基材,其中在回收期间通过防止气体吸收的介质对基材载体进行传导和/或加热。

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