CHARGED PARTICLE BEAM DRAWING DEVICE AND STABILIZATION METHOD FOR DAC AMPLIFIER

摘要

PROBLEM TO BE SOLVED: To provide a charged particle beam drawing device and a stabilization method for a DAC amplifier such that high-precision drawing processing can be performed while minimizing an influence of change in an output voltage on an electron beam even in such a case by placing the DAC amplifier which has feedback resistance set in advance in a standard heat generation state by applying a voltage having a maximum value set for the DAC amplifier for the feedback resistance.SOLUTION: The charged particle beam drawing device includes a drawing part 2 which draws a pattern on a sample mounted on a movable stage using a charged particle beam B; DAC amplifiers 34, 35 which apply a voltage to a deflector arranged along the optical path of the charged particle beam B; and a control part 3 which comprises a control computer 31 including a DAC amplifier control part 31j performing control over the DAC amplifiers 34, 35, and the DAC amplifier control part 31j continuously applies the voltage having a maximum value set for the DAC amplifiers 34, 35.