Photoresist stripper composition and photoresist method of peeling using this

摘要

The present invention relates to photoresist stripping composition. More specifically, by including a compound represented by Formula 1, the peeling capability of the photoresist is excellent, photoresist stripping composition according to the invention, if the molybdenum (Mo) is included in the photo resist lower layer corrosion prevention force against the bottom photoresist film is also excellent.