Resist pattern forming method and low-molecular-weight positive-tone radiation-sensitive composition

摘要

resist pattern shape [challenge] obtained is good and to provide a method of forming a resist pattern using a sensitive radiation-sensitive composition and radiation-sensitive composition, including easy resist material (compound) production and quality control. Has at least one molecule a carboxyl group or a phenolic hydroxyl group was introduced [SOLUTION] The (A) acid-dissociable functional group, and it insoluble in an alkali developer but becomes soluble in an alkali developing solution under action of acid , a molecular weight having a carboxyl group or a phenolic hydroxyl group of at least one low molecular weight compound 1.00 ≦ Mw / Mn ≦ 1.05 at 400~3000 (A), in the molecule, and there are soluble in an alkaline developer , (E), and positive-tone radiation-sensitive solvent containing low molecular weight compound 1.00 ≦ Mw / Mn ≦ 1.05 at 350~2500 (B), acid generator (C), acid diffusion control agent is molecular weight composition. And, a method of forming a resist pattern using the composition.