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Alternating self-assembling morphologies of diblock copolymers controlled by variations in surfaces
Alternating self-assembling morphologies of diblock copolymers controlled by variations in surfaces
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机译:受表面变化控制的二嵌段共聚物的交替自组装形态
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摘要
Methods for fabricating sublithographic, nanoscale microstructures arrays including openings and linear microchannels utilizing self-assembling block copolymers, and films and devices formed from these methods are provided. In some embodiments, the films can be used as a template or mask to etch openings in an underlying material layer.
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