The present invention relates to a process for production of a TiO2-SiO2 glass body, comprising: a step of, when an annealing point of a TiO2-SiO2 glass body after transparent vitrification is taken as T1 (°C), heating the glass body after transparent vitrification at a temperature of T1+400°C or more for 20 hours or more; and a step of cooling the glass body after the heating step up to T1-400 (°C) from T1 (°C) in an average temperature decreasing rate of 10°C/hr or less.
展开▼