The present invention relates to a process for production of a TiO 2 -SiO 2 glass body, comprising a step of, when an annealing point of a TiO 2 -SiO 2 glass body after transparent vitrification is taken as T 1 (°C), holding the glass body after transparent vitrification in a temperature region of from T 1 -90 (°C) to T 1 -220 (°C) for 120 hours or more.
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