DOUBLE-CLOSED-LOOP FEEDBACK POSITIONING CONTROL SYSTEM OF SAMPLE APPLICATOR AND CONTROL METHOD

摘要

A double-closed-loop feedback positioning control system of a sample applicator and a control method thereof. The system is formed by an inner-loop feedback compensation system and an outer-loop feedback compensation system. The inner-loop feedback compensation system comprises an X-direction moving mechanism driving positioning of a sample application needle, a Y-direction moving mechanism, and an inner-loop control system. The outer-loop feedback compensation system comprises an X-direction grating ruler and an X-direction grating read head that are connected to the X-direction moving mechanism, and a Y-direction grating ruler and a Y-direction grating read head that are connected to the Y-direction moving mechanism. The X-direction grating read head and the Y-direction grating read head are connected to an outer-loop control system. The double-closed-loop feedback positioning control system ensures the success of a positioning judgment, and improves the operation stability and reliability of the system.