Coating method for depositing a coating system on a substrate and substrate with a coating system

摘要

Coating method for depositing a layer system formed from hard material layers, on a substrate, comprises (a) providing an evacuatable process chamber (2) comprising a cathodic vacuum arc evaporation source (Q1) having an evaporation material (M1), and a magnetron discharge source (Q2) having a discharge material (M2), (b) depositing at least one contact layer comprising the evaporation material, on the surface of substrate, (c) depositing at least one intermediate layer in the form of e.g. a nanostructured mixed layer, and (d) depositing at least one outer layer comprising discharge material. Coating method for depositing a layer system formed from hard material layers, on a substrate, comprises (a) providing an evacuatable process chamber (2) comprising a cathodic vacuum arc evaporation source (Q1) having an evaporation material (M1), and a magnetron discharge source (Q2) having a discharge material (M2), which is operated in a high power impulse magnetron sputtering mode, (b) depositing at least one contact layer comprising the evaporation material, on the surface of the substrate in a cathodic vacuum arc evaporation method only using the cathodic vacuum arc evaporation source, (c) depositing at least one intermediate layer in the form of a nanostructured mixed layer, preferably a nano-layered intermediate layer in a hybrid phase or as a nanocomposite layer comprising the evaporation material and the discharge material, by parallel operation of the cathodic vacuum arc evaporation source and the magnetron discharge source, and (d) depositing at least one outer layer comprising the discharge material only using the magnetron discharge source. An independent claim is also included for a substrate comprising a layer system formed by the above coating method, where the contact layer exhibits a thickness of 0-50000 nm, the intermediate layer exhibits a thickness of 50-10000 nm, and the outer layer exhibits a thickness of 10-10000 nm.