THERMAL TREATMENT DEVICE CAPABLE OF REDUCING THE SURFACE ROUGHNESS OF A SUBSTRATE BY INCREASING THERMAL EFFICIENCY

摘要

PURPOSE: A thermal treatment device is provided to improve the uniformity of heating by using a gas heating source with a glow discharge.;CONSTITUTION: A sample(101) is thermally treated in a thermal treatment chamber(100). A first flat electrode(102) is arranged in the thermal treatment chamber. A second flat electrode(103) heats the sample. An RF power source(111) supplies RF power to the first flat electrode to generate plasma. The sample is located on a sample holder(104). The second flat electrode is composed of a disk member and a beam installed on the outer side of the disk member. The second flat electrode is fixed by the beam.;COPYRIGHT KIPO 2013;[Reference numerals] (AA) Exhaust