STRUCTURE AND METHOD FOR SIMULTANEOUSLY DETERMINING AN OVERLAY ACCURACY AND PATTERN PLACEMENT ERROR

摘要

The present invention provides a technique to get the overlay error and pattern placement error information from a single measurement structure (200) The . This single measurement structure (221, 241) the periodic sub- structure in two or more layers of different devices ( 210,220,240,250 ) is achieved by forming , at least one divided portion 200 and the non-partitioned installment (211 , 251 ) is provided on the different device layers .