首页> 外国专利> Optical arrangement of illumination device of micro-lithographic projection exposure system, converts input polarization distribution of light into desired output polarization distribution due to Faraday rotation of optical element

Optical arrangement of illumination device of micro-lithographic projection exposure system, converts input polarization distribution of light into desired output polarization distribution due to Faraday rotation of optical element

机译:微光刻投影曝光系统的照明设备的光学装置,由于光学元件的法拉第旋转,将光的输入偏振分布转换为所需的输出偏振分布

摘要

The polarization-influencing optical arrangement has generating unit for generating a magnetic field in the region of a transmissive optical element (200). A given input polarization distribution of incident light is converted into a desired output polarization distribution due to Faraday rotation of the transmissive optical element, during operation of the optical system. The transmissive optical element is provided with a spherical optical effective area. Independent claims are included for the following: (1) an illumination device; and (2) method for micro-lithographic manufacture of micro-structured components.
机译:影响偏振的光学装置具有用于在透射光学元件(200)的区域中产生磁场的产生单元。在光学系统的操作期间,由于透射光学元件的法拉第旋转,入射光的给定输入偏振分布被转换为期望的输出偏振分布。透射光学元件设置有球形光学有效区域。包括以下方面的独立权利要求:(1)照明装置; (2)微光刻制造微结构部件的方法。

著录项

  • 公开/公告号DE102012206159A1

    专利类型

  • 公开/公告日2013-06-20

    原文格式PDF

  • 申请/专利权人 CARL ZEISS SMT GMBH;

    申请/专利号DE201210206159

  • 发明设计人 SAENGER INGO;SCHLESENER FRANK;

    申请日2012-04-16

  • 分类号G03F7/20;G02B27/28;G02F1/09;

  • 国家 DE

  • 入库时间 2022-08-21 16:21:44

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