首页> 外国专利> Making planar electrochemical microcell used in analysis system, comprises providing substrate including first and second layers made of electrically insulating and conductive materials, and etching second layer by laser radiation pulses

Making planar electrochemical microcell used in analysis system, comprises providing substrate including first and second layers made of electrically insulating and conductive materials, and etching second layer by laser radiation pulses

机译:制备用于分析系统的平面电化学微电池,包括提供包括由电绝缘和导电材料制成的第一和第二层的衬底,以及通过激光辐射脉冲蚀刻第二层

摘要

The method comprises providing (2) a substrate that extends along its plane and comprises a first layer made of an electrically insulating material whose resistivity at a temperature of 20[deg] C is greater than 10 5 omega m and a second layer made of an electrically conductive material whose resistivity at a temperature of 20[deg] C is less than 10 - 4 omega m, and etching (2) the second layer to define and electrically insulate a working electrode, a counter electrode and a reference electrode. The etching step is carried out by laser radiation pulses. The method comprises providing (2) a substrate that extends along its plane and comprises a first layer made of an electrically insulating material whose resistivity at a temperature of 20[deg] C is greater than 10 5 omega m and a second layer made of an electrically conductive material whose resistivity at a temperature of 20[deg] C is less than 10 - 4 omega m, and etching (2) the second layer to define and electrically insulate a working electrode including a first measuring face that is parallel to the plane of substrate and has a surface of = 100 nm 2, a counter electrode including a second measuring face that is parallel to the plane of substrate, extends around the first measuring face and has a surface, which is ten times greater than that of the first measuring face and a reference electrode including a third measuring face that is parallel to the plane of substrate. The second layer is directly disposed on the first layer, and is made of a carbonaceous material. The etching step is carried out by laser radiation pulses, where a duration of each pulse is less than 100 ps and the pulses are repeated at a repetition frequency of = 1kHz. An independent claim is included for an electrochemical analysis system.
机译:该方法包括提供(2)沿其平面延伸的基板,该基板包括由电绝缘材料制成的第一层,该第一层在20℃的温度下的电阻率大于10 5Ωm,并且由第二层制成。一种导电材料,其在20℃的温度下的电阻率小于10-> 4>Ω,并蚀刻(2)第二层以定义工作电极,对电极和参比电极并使之电绝缘。蚀刻步骤通过激光辐射脉冲进行。该方法包括提供(2)沿其平面延伸的基板,该基板包括由电绝缘材料制成的第一层,该第一层在20℃的温度下的电阻率大于10 5Ωm,并且由第二层制成。一种导电材料,其在20℃的温度下的电阻率小于10-> 4>Ωm,并蚀刻(2)第二层以定义并电绝缘包括平行于第一测量面的工作电极相对电极包括相对于基板平面并具有大于等于100 nm 2>的表面的对电极,该反电极包括与基板平面平行的第二测量面,该对电极围绕第一测量面延伸,并且其表面大十倍第一测量面和参考电极包括与基板的平面平行的第三测量面。第二层直接设置在第一层上,并且由碳质材料制成。通过激光辐射脉冲执行蚀刻步骤,其中每个脉冲的持续时间小于100 ps,并且以> = 1kHz的重复频率重复脉冲。电化学分析系统包括独立权利要求。

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