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Functional device array with self-aligned electrode structures and fabrication methods thereof

机译:具有自对准电极结构的功能器件阵列及其制造方法

摘要

A functional device array with self-aligned electrode structures and fabrication methods thereof are presented. The functional device array includes a transparent substrate. A patterned lower electrode array is disposed on the transparent substrate. A spacer structure is disposed overlying the transparent substrate and located between the patterned lower electrodes self-aligned therewith. A functional structure layer is disposed in an array of pixel regions defined by the spacer structure. A patterned upper substrate is disposed on the functional structure layer corresponding to each of the pixel regions, and a passivation layer is disposed on the patterned upper electrode covering the functional device array.
机译:提出了具有自对准电极结构的功能器件阵列及其制造方法。功能器件阵列包括透明基板。图案化的下部电极阵列设置在透明基板上。间隔物结构设置在透明基板上并位于与之自对准的图案化下部电极之间。功能结构层设置在由间隔物结构限定的像素区域的阵列中。图案化的上基板设置在与每个像素区域相对应的功能结构层上,钝化层设置在覆盖功能器件阵列的图案化的上电极上。

著录项

  • 公开/公告号US8582040B2

    专利类型

  • 公开/公告日2013-11-12

    原文格式PDF

  • 申请/专利权人 CHIH SHENG HOU;WEI-HSIN HOU;

    申请/专利号US20080274762

  • 发明设计人 CHIH SHENG HOU;WEI-HSIN HOU;

    申请日2008-11-20

  • 分类号G02F1/1335;G02F1/1339;G06K11/06;

  • 国家 US

  • 入库时间 2022-08-21 16:01:54

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