首页>
外国专利>
TRANSPARENT ELECTROCONDUCTIVE THIN FILM COMPOSITION, METHOD FOR FORMING TRANSPARENT ELECTROCONDUCTIVE THIN FILM USING SAME, AND TRANSPARENT ELECTROCONDUCTIVE THIN FILM MANUFACTURED THEREBY
TRANSPARENT ELECTROCONDUCTIVE THIN FILM COMPOSITION, METHOD FOR FORMING TRANSPARENT ELECTROCONDUCTIVE THIN FILM USING SAME, AND TRANSPARENT ELECTROCONDUCTIVE THIN FILM MANUFACTURED THEREBY
展开▼
机译：透明导电性薄膜组合物，使用相同的透明导电性薄膜的形成方法及其制造的透明导电性薄膜
展开▼
页面导航
摘要
著录项
相似文献
摘要
According to one embodiment of the present invention, disclosed are a transparent electroconductive thin film composition, a method for forming a transparent electroconductive thin film using the same, and a transparent electroconductive thin film manufactured thereby. The transparent electroconductive thin film composition includes indium (In), gallium (Ga), boron (B), zinc (Zn), and oxygen (O2), wherein the ratio of the indium, gallium, boron, and zinc, (In+Ga)/(In+Ga+B+Zn), is 25 to 65 atomic percent and boron content is 4-8 atomic percent.;COPYRIGHT KIPO 2014
展开▼
机译：根据本发明的一个实施方式，公开了一种透明导电薄膜组合物，使用该透明导电薄膜组合物形成透明导电薄膜的方法以及由此制造的透明导电薄膜。透明导电薄膜组合物包括铟（In），镓（Ga），硼（B），锌（Zn）和氧（O2），其中铟，镓，硼和锌的比例为（In + Ga）/（In + Ga + B + Zn）为25％至65％原子百分比，硼含量为4-8％原子百分比;; COPYRIGHT KIPO 2014
展开▼
