A DRY STRIPPING DEVICE, A NOZZLE GENERATING SUPERSPEED PARTICLE BEAM FOR DRY STRIPPING AND A DRY STRIPPING METHOD OF USING SUPERSPEED PARTICLE BEAM

摘要

A dry separation method, according to the present invention, is a dry separation method for ashing a photoresist, comprising a spraying and separating step of spraying sublimation particles on the photoresist and separating the photoresist. Also, a dry separation apparatus, according to the present invention, is a dry separation apparatus for ashing a photoresist, comprising a nozzle for generating a high-speed particle beam that comprises sublimation particles, wherein the nozzle generates ultra-high speed uniform nanoparticles by enabling particle generation gas comprising carbon dioxide to pass through and comprises an expanding portion having a shape that the cross sectional area thereof becomes wider toward a discharge side of the nozzle, wherein the expanding portion sequentially comprises a first expanding portion and a second expanding portion, and wherein an average expansion angle of the second expanding portion is bigger than an expansion angle of the first expanding portion.