Wafer support with devices for improving the heating speed equal to moderately in systems for the chemical vapor deposition

摘要

The wafer carrier assembly for use in a system for the growth of an epitaxial layers on one or more wafers by chemical vapor deposition (cvd), wherein the the wafer carrier assembly comprising:a wafer carrier body, of the symmetrically about a central axis is formed and includes a generally planar upper side, which is perpendicular to the central axis is arranged;at least one wafer holding pocket, which in the wafer carrier body is recessed from the top side, each wafer holding pocket a bottom surface and a surrounding wall surface which surrounds the bottom surface and a circumference of said wafer holding pocket is defined, wherein the wafer holding pocket is configured to provide a wafer to keep within the circumference, if it is rotated around the central axis; andthe wafer holding pocket of the further is configured for a wafer with at least one flat edge, whereby a portion of the bottom surface, via which the at least one flat edge of the wafer is held, has a raised portion, the less is cut out of the form of portions of the bottom surface, which is below a rounded edge portions of the wafer are.