Photomask blank, a photomask, a reflective mask blank and the reflective mask, as well as methods for their production

摘要

PROBLEM TO BE SOLVED: To provide a photo-mask blank capable of forming an extremely minute pattern, and to provide a photo-mask with a minute pattern formed on the photo-mask blank.;SOLUTION: A photo-mask blank comprises a thin film consisting of at least two layers on a transparent substrate. The thin film comprises: a first layer consisting of material containing tantalum, nitrogen, and xenon; and a second layer consisting of material containing tantalum, oxygen and argon laminated on an upper surface of the first layer.;COPYRIGHT: (C)2013,JPO&INPIT