A charged particle beam writing apparatus and a charged particle beam writing method.

摘要

PROBLEM TO BE SOLVED: To provide a charged particle beam lithography apparatus and method that can correct dimensional variation more simply.;SOLUTION: A lithography apparatus 100 has a width dimension calculator 62 for calculating a line width dimension of a graphic constituting a pattern with respect to a correction direction represented by graphic data defining a coordinate, x,y-direction sizes and the correction direction every graphic, a pattern density calculator 60 for calculating the pattern density of a mesh region in which the graphic is disposed, a dose correction coefficient calculator 64 for calculating a dose correction coefficient to correct the width dimension by using the line width dimension and the pattern density as parameters, an irradiation amount corrector 70 for calculating a second irradiation amount by multiplying a first irradiation amount for drawing a graphic by the correction coefficient, and a drawing unit 150 for drawing a graphic on a sample with the second irradiation amount.;COPYRIGHT: (C)2013,JPO&INPIT