首页>
外国专利>
Method and Apparatus for Predicting a Growth Rate of Deposited Contaminants
Method and Apparatus for Predicting a Growth Rate of Deposited Contaminants
展开▼
机译:预测沉积污染物增长率的方法和设备
展开▼
页面导航
摘要
著录项
相似文献
摘要
A lithography system (10) comprising a radiation projection system (20) for projecting radiation onto a substrate, a substrate transport system (30) for loading and positioning the substrate to be processed in the path of the projected radiation, a control system (40) for controlling the substrate transport system to move the substrate, and a resist characterization system (50) arranged for determining whether a specific type of resist is suitable to be exposed by radiation within the lithography system. The resist characterization system (50) may be arranged for exposing the resist on a surface of the substrate with one or more radiation beams, measuring a mass distribution of molecular fragments emitted from the resist, predicting a growth rate of deposited molecular fragments on the basis of a growth rate model and the measured mass distribution, and comparing the expected growth rate with a predetermined threshold growth rate.
展开▼