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Method for preparing a porous anti-reflection thin film composed of hollow polymeric nanoparticles

机译:由中空聚合物纳米粒子组成的多孔抗反射薄膜的制备方法

摘要

A method for preparing a porous anti-reflective thin film composed of hollow polymer nano-particles is provided in the following steps: Firstly, an aqueous dispersion having mass percent of 3-7% is prepared using polymer nano-capsules. A thin film comprising polymer nano-capsules is formed by spin coating on one side or both sides of the substrate using a spin coater. The thin film comprising polymer nano-capsules is dried in vacuum at high temperature. After the core materials of the polymer nano-capsules evaporate completely, the polymer nano-capsules turn into hollow polymer nano-particles, and a porous anti-reflective thin film composed of hollow polymer nano-particles is prepared. The thickness and refractive index of the thin film are adjusted conveniently and effectively by changing the concentration of polymer nano-capsules aqueous dispersion and the hollow volume rate of the polymer nano-particles. The thin film has the advantages of high mechanical intensity and abrasion resistance.
机译:在以下步骤中提供了一种制备由中空聚合物纳米粒子组成的多孔抗反射薄膜的方法:首先,使用聚合物纳米胶囊制备质量百分比为3-7%的水分散体。通过使用旋涂机在基板的一侧或两侧上旋涂而形成包含聚合物纳米胶囊的薄膜。包含聚合物纳米胶囊的薄膜在真空中在高温下干燥。在聚合物纳米胶囊的核心材料完全蒸发后,聚合物纳米胶囊变成空心的聚合物纳米颗粒,制备了由空心的聚合物纳米颗粒组成的多孔抗反射薄膜。通过改变聚合物纳米胶囊水分散体的浓度和聚合物纳米粒子的中空体积率,可以方便,有效地调节薄膜的厚度和折射率。该薄膜具有机械强度高和耐磨性的优点。

著录项

  • 公开/公告号US9180486B2

    专利类型

  • 公开/公告日2015-11-10

    原文格式PDF

  • 申请/专利权人 ZHIJUAN SUN;XIANG GAO;YINGWU LUO;

    申请/专利号US201113824831

  • 发明设计人 ZHIJUAN SUN;XIANG GAO;YINGWU LUO;

    申请日2011-05-31

  • 分类号B05D3/12;B05D5/06;G02B1/111;G02B5/02;B01J13/14;B01J13/20;B05D1;B82Y20;B82Y30;G02B1/118;

  • 国家 US

  • 入库时间 2022-08-21 15:19:24

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