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Plasma mediated ashing processes that include formation of a protective layer before and/or during the plasma mediated ashing process
Plasma mediated ashing processes that include formation of a protective layer before and/or during the plasma mediated ashing process
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机译:等离子体介导的灰化过程,包括在等离子体介导的灰化过程之前和/或期间形成保护层
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摘要
A method for processing a substrate includes arranging a substrate including masked portions and unmasked portions in a process chamber; creating plasma in a process chamber; supplying a passivation gas mixture that includes nitrogen or carbon to create a plasma passivation gas mixture; exposing a substrate to the plasma passivation gas mixture to create a passivation layer on the unmasked portions of the substrate; supplying a stripping gas mixture that includes oxygen to the plasma to create a plasma stripping gas mixture; exposing the substrate to the plasma stripping gas mixture to strip at least part of the masked portions and at least part of the unmasked portions; and repeating creating the passivation layer and the stripping to remove a predetermined amount of the masked portions.
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