首页> 外国专利> Mold for thermal nanoimprint lithography, process for fabricating the same, and nanoimprint process using the same

Mold for thermal nanoimprint lithography, process for fabricating the same, and nanoimprint process using the same

机译:用于热纳米压印光刻的模具,其制造工艺以及使用该模具的纳米压印工艺

摘要

A heating mold for thermal nanoimprint lithography is disclosed. According to one aspect, the mold includes a resistive heating element and collecting element for collecting the electromagnetic energy of a variable electromagnetic field emitted by a source located outside the mold. The collecting element being connected to the resistive heating element in which the electromagnetic energy is dissipated. A method for manufacturing the mold, a thermal nanoimprint lithography device including the mold, and a a method for preparing a substrate including a surface nanostructured by a thermal nanoimprint lithography technique using the mold is applied are also disclosed.
机译:公开了一种用于热纳米压印光刻的加热模具。根据一个方面,模具包括电阻加热元件和收集元件,用于收集由位于模具外部的源发射的可变电磁场的电磁能。收集元件连接到电阻加热元件,在该电阻加热元件中消散了电磁能。还公开了一种模具的制造方法,包括该模具的热纳米压印光刻设备以及使用该模具制备包括通过热纳米压印光刻技术形成的表面纳米结构的基板的方法。

著录项

  • 公开/公告号US8974215B2

    专利类型

  • 公开/公告日2015-03-10

    原文格式PDF

  • 申请/专利权人 STEFAN LANDIS;SERGIO NICOLETTI;

    申请/专利号US201113227388

  • 发明设计人 STEFAN LANDIS;SERGIO NICOLETTI;

    申请日2011-09-07

  • 分类号A01J21/00;G03F7/00;B82Y10/00;B82Y40/00;

  • 国家 US

  • 入库时间 2022-08-21 15:17:04

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