SOLUTION FOR TESTING MOISTURE CONTENT IN PHOTORESIST STRIPPING SOLUTION AND TESTING METHOD

摘要

Provided is a solution for testing moisture content in photoresist stripping solution, the photoresist stripping solution comprising organic fatty amine, and the test solution being aromatic organic acid; the aromatic organic acid neutralizes the organic fatty amine to make the photoresist stripping solution weakly acidic; the mass of the aromatic organic acid is 1.2-1.5 times the mass of an equivalent thereof; the organic fatty amine is monoethanolamine; the aromatic organic acid is benzoic acid or salicylic acid. Adding excess aromatic organic acid to the stripping solution of the organic fatty amine, controlling the proportion of the aromatic organic acid to the stripping solution, and pre-neutralizing the organic fatty amine in an inert solvent ensures complete reaction between the organic fatty amine and the aromatic organic acid, and prevents the PH value of the solution from being affected by the excess aromatic organic acid; the excess aromatic organic acid will not upset system balance, thus avoiding side reaction, ensuring accurate and quick measurement and easy and quick operation, and saving cost and improving test timeliness.