Provided is a reflective photomask blank that, during production of reflective photomasks, is capable: of reducing position displacement of transfer patterns caused by compressive stress of a reflective multi-layer film even if the reflective multi-layer film in the vicinity of the pattern area is removed and a light-shielding frame is formed; and of improving positional accuracy of an image being transferred. This reflective photomask blank (502) has the reflective multi-layer film (20) and an absorption film (30) provided layered in said order, on one surface of a substrate (10), and a conductive film (50) provided on the other surface of the substrate (10). A fiducial mark (42) and a position measurement mark (34) are provided on an outer circumference section of the reflective photomask blank (502). The position measurement mark (34) is used to correct the effect of stress released when the light-shielding frame is formed.
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