首页> 外国专利> GLASS SUBSTRATE COATED WITH A STACK HAVING SCATTERING REFLECTION AND SPECULAR TRANSMISSION

GLASS SUBSTRATE COATED WITH A STACK HAVING SCATTERING REFLECTION AND SPECULAR TRANSMISSION

机译:玻璃基质涂有散射和反射透射的堆栈

摘要

The invention relates to: - a non-rough glass substrate coated with a stack of thin layers which finishes with a mixed zinc tin oxide layer having a thickness of between 15 and 60 nm, then with a silicon nitride layer having a thickness of between 20 and 100 nm, detached from place to place from said mixed oxide layer so as to form delamination blisters having a size of between of 1 and 20 nm; a process for manufacturing this substrate, comprising the operations that consist in - depositing by sputtering, especially magnetron sputtering, on a non-rough glass substrate optionally coated with at least one thin layer, a mixed zinc tin oxide layer, the oxygen content of which is lower than that completely saturating the oxidation process of these two metals simultaneously, and having a thickness of between 15 and 60 nm, then a silicon nitride layer having a thickness of between 20 and 100 nm and having an intrinsic compressive stress at least equal to 1 GPa, then in - subjecting the assembly to a heat treatment between 500 and 750 °C for 7 to 15 minutes; the application of this substrate, as transparent motor vehicle roof, façade or spandrel glass, anti-reflective low-emissivity motor vehicle roof, anti‑ reflective windscreen, low-emissivity building glazing, or projection screen.
机译:本发明涉及:-涂覆有薄层堆叠的非粗糙玻璃基板,其以厚度为15至60nm的混合的锌锡氧化物层,然后厚度为20的氮化硅层结束。 100nm,从所述混合氧化物层到处分离,从而形成尺寸在1-20nm之间的分层气泡。一种制造该基底的方法,包括以下操作:-通过溅射,特别是磁控溅射,在非粗糙玻璃基底上沉积,该非粗糙玻璃基底任选地涂覆有至少一层薄层,所述混合层的氧化锌锡层的氧含量为低于同时完全饱和这两种金属的氧化过程且厚度在15到60 nm之间的氮化硅层,然后氮化硅层的厚度在20到100 nm之间并且固有压缩应力至少等于1 GPa,然后对组件进行500至750°C的热处理7至15分钟;该基材的应用,如透明的汽车车顶,外墙或拱形玻璃,抗反射的低辐射汽车顶盖,抗反射的挡风玻璃,低辐射的建筑玻璃或投影屏。

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