PHOTOCURABLE COMPOSITION, CURED PRODUCT, PRODUCTION METHOD OF FILM WITH PATTERN BY USE THEREOF, PRODUCTION METHOD OF OPTICAL PART, PRODUCTION METHOD OF CIRCUIT BOARD, AND PRODUCTION METHOD OF ELECTRONIC PART

摘要

PROBLEM TO BE SOLVED: To provide a photocurable composition which enables the suppression of a curing failure and the reduction in defects in a pattern in an imprint process under an atmosphere of gas containing a condensing gas.SOLUTION: A photocurable composition comprises at least (A)a polymerizable compound component, and (B)a photoinitiator component. The component (B) is a compound of which the saturation solubility in a condensing gas staying in a liquid state under the condition of 1 atm at 5°C is less than 1 wt.%, or the Hansen distance (Ra) to the condensing gas is larger than 7.6.