aqueous acid etching solution, texturing method of single crystal and polycrystalline silicon substrate surface of

摘要

Being the water Acid etching solution which is suited for the texturing of the surface of the silicon substrate of the monocrystal and polycrystals, the gross mass of the solution as a standard, 3 - 10 mass % the hydrofluoric acid; 10 - 35 mass % nitric acid; 5 - 40 mass % sulfuric acid; And 55 - 82 mass % the water, it contains. Being the manner which the surface of the silicon substrate of the monocrystal and polycrystals texturing is done, (1) the monocrystal or step and (2) at least the main surface of 1 of the silicon substrate of polycrystals, is made to contact with above-mentioned water Acid etching solution predetermined time, the step which removes at least the main surface of 1 of the substrate from contact with the step and (3) the water Acid etching solution which etch at least the main surface of 1 of the substrate sufficiently at specified temperature and, it has in order to obtain the surface configuration which consists of the crevice and the convex section. Furthermore, the optical generation of electricity electrolysis cell and the solar battery electrolysis cell are produced making use of the above-mentioned solution and manner. Choice figure It is not