SPUTTERING SYSTEM AND METHOD USING DIRECTION-DEPENDENT SCAN SPEED OR POWER

• 1. 使用依赖于方向的扫描速度或功率的溅射系统及方法 [P] . 中国专利： CN106414794A . 2017-02-15
• 2. 薄膜晶体管及薄膜晶体管基板及它们的制造方法及使用了它们的液晶显示装置及相关的装置及方法以及溅射靶及使用它成膜的透明导电膜及透明电极及相关的装置及方法 [P] . 中国专利： CN1918672A . 2007-02-21
• 3. Sputtering system and sputtering method using direction-dependent scanning speed or scanning power [P] . 日本专利： JP2017508892A . 2017-03-30

  机译： 使用与方向有关的扫描速度或扫描功率的溅射系统和溅射方法

• 4. Magnetron type sputtering system and method using a direction-dependent scanning speed or power [P] . 德国专利： DE112015000895T5 . 2016-11-03

  机译： 使用与方向有关的扫描速度或功率的磁控管型溅射系统和方法

• 5. Sputtering system and method using direction-dependent scan speed or power [P] . 美国专利： US10106883B2 . 2018-10-23

  机译： 使用与方向有关的扫描速度或功率的溅射系统和方法

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• 1. Synthesis and properties of Cr-Al-Si-N films deposited by hybrid coating system with high power impulse magnetron sputtering (HIPIMS) and DC pulse sputtering [J] . Min Su KANG ,Tie-gang WANG ,Jung Ho SHIN . 中国有色金属学会会刊：英文版 . 2012,第S3期
• 2. Scanning PIV Method and Its Application to the Calorimetry of Ground Source Heat Pump Systems [J] . Shumpei Funatani ,Shinya Amano ,Tetsuaki Takeda . 流量控制、测量及可视化（英文） . 2018,第1期
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