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HYDROGENATION TREATMENT METHOD, HYDROGENATION TREATMENT APPARATUS, AND HYDROGENATION TREATMENT RECORDING MEDIUM

机译:加氢处理方法,加氢处理装置以及加氢处理记录介质

摘要

The present invention provides a hydrogenation treatment method, a hydrogenation treatment apparatus, and a recording medium, capable of stably and fully assigning a hydrogenation degree expected in accordance with a heat treatment temperature of a substrate to the substrate. The hydrogenation treatment method is for hydrogenation of a surface of the substrate. To this end, the hydrogenation treatment method includes the following processes: (A) supplying a process gas for hydrogenation on the surface of the substrate; (B) exposing the surface of the substrate to an atmosphere including the process gas over a preset period of time; and (C) heating the substrate under the existence of the process gas after the process (B).;COPYRIGHT KIPO 2016
机译:本发明提供一种氢化处理方法,氢化处理装置以及记录介质,其能够稳定且充分地将根据基板的热处理温度期望的氢化度分配给基板。氢化处理方法是用于基板表面的氢化。为此,氢化处理方法包括以下步骤:(A)在基板的表面上供应用于氢化的处理气体; (B)在预定的时间段内将基板的表面暴露于包括处理气体的气氛中; (C)在工序(B)之后,在存在处理气体的情况下加热基板。; COPYRIGHT KIPO 2016

著录项

  • 公开/公告号KR20160023562A

    专利类型

  • 公开/公告日2016-03-03

    原文格式PDF

  • 申请/专利权人 TOKYO ELECTRON LIMITED;

    申请/专利号KR20150114599

  • 申请日2015-08-13

  • 分类号H01L21/027;H01L21/02;H01L21/324;

  • 国家 KR

  • 入库时间 2022-08-21 14:15:01

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