Masking out before the direction for more compartment charge part chen rays, more compartment charge part chen beam - write apparatus and method for blocking of a defective beam for more compartment charge part chen beams

摘要

A screening out before the direction for multiple beams grouped contains a plurality of separate mask systems, which in each case carry out a fading out of control, which produce a corresponding beam of more compartment charge part chen beams between a beam - to - state and a beam - from - state, and the in each case a first electrode, a first potential properly applied mechanism, of the selectively two different potentials at the first electrode for the fading-out control, and a second electrode, which comprise a fading out of deflection of the corresponding beam, wherein the second electrode is grounded and paired with the first electrode, and a potential change mechanism, which a potential of the second electrode of a ground potential to a potential other changes, wherein, when a potential of the first electrode, which in any one of the separate mask systems is contained, is fixed on the ground potential, the potential change mechanism, the potential of the second electrode, which corresponds to the first electrode, which is fixed on the ground potential, of the ground potential to the other potential changes.