首页> 外国专利> Wafer-trilayer adhesive layer-support composite, wafer support with trilayer adhesive layer for use in wafer processing, trilayer adhesive layer for use in wafer processing, method of manufacturing said composite and method of manufacturing a thin wafer using said composite

Wafer-trilayer adhesive layer-support composite, wafer support with trilayer adhesive layer for use in wafer processing, trilayer adhesive layer for use in wafer processing, method of manufacturing said composite and method of manufacturing a thin wafer using said composite

机译:晶片-三层粘合剂层-载体复合材料,具有用于晶片加工的三层粘合剂层的晶片载体,用于晶片加工的三层粘合剂层,制造所述复合材料的方法以及使用所述复合材料制造薄晶片的方法

摘要

A wafer processing laminate is provided comprising a support (3), a temporary adhesive layer (2), and a wafer (1). The temporary adhesive layer (2) has a trilayer structure consisting of a first temporary bond layer (A) of thermoplastic siloxane bond-free polymer, a second temporary bond layer (B) of thermoplastic siloxane polymer, and a third temporary bond layer (C) of thermosetting modified siloxane polymer. In a peripheral region, the second layer (B) is removed so that the first layer (A) is in close contact with the third layer (C).
机译:提供了一种晶片处理层压板,其包括支撑件(3),临时粘合剂层(2)和晶片(1)。临时粘合剂层(2)具有三层结构,其由无热塑性硅氧烷键合聚合物的第一临时粘合层(A),热塑性硅氧烷聚合物的第二临时粘合层(B)和第三临时粘合层(C)组成)的热固性改性硅氧烷聚合物。在外围区域中,去除第二层(B),使得第一层(A)与第三层(C)紧密接触。

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