Polymer comprising repeating unit having photoacid generating functional group and base solubility improving functional group, related photoresist composition, and method for forming electronic device

摘要

A polymer includes repeat units, at least half of which are photoacid-generating repeat units. Each of the photoacid-generating repeat units includes photoacid-generating functionality and base-solubility-enhancing functionality. The polymer is useful as a component of a photoresist composition that further includes a second polymer that exhibits a change in solubility in an alkali developer under action of acid.