Observation apparatus, device, device manufacturing method, particle size measurement method, resistance observation method, chemical reaction method, particle storage method, and automatic observation apparatus

摘要

The observation apparatus (100) includes an observation optical system (101) capable of obtaining an image of the measurement object existing in the gap of the device (1). The gap of the device (1) is wider at one end than at the other end, and when the device (1) is irradiated with light, interference fringes are generated in the gap. The observation optical system (101) irradiates the gap of the device (1) with a plurality of lights having different wavelengths to generate a plurality of interference fringes in the gap. Then, the observation optical system (101) obtains a plurality of interference fringe images.