首页> 外国专利> Low voltage avalanche photodiode with re-entrant mirror for silicon based photonic integrated circuits

Low voltage avalanche photodiode with re-entrant mirror for silicon based photonic integrated circuits

机译:带有凹入镜的低压雪崩光电二极管,用于硅基光子集成电路

摘要

A low voltage APD is disposed at an end of a waveguide extending laterally within a silicon device layer of a PIC chip. The APD is disposed over an inverted re-entrant mirror co-located at the end of the waveguide to couple light by internal reflection from the waveguide to an under side of the APD. In exemplary embodiments, a 45°-55° facet is formed in the silicon device layer by crystallographic etch. In embodiments, the APD includes a silicon multiplication layer, a germanium absorption layer over the multiplication layer, and a plurality of ohmic contacts disposed over the absorption layer. An overlying optically reflective metal film interconnects the plurality of ohmic contacts and returns light transmitted around the ohmic contacts to the absorption layer for greater detector responsivity.
机译:低压APD设置在波导的一端,该波导在PIC芯片的硅器件层内横向延伸。 APD设置在位于波导端部的倒置凹入反射镜上方,以通过内部反射将光从波导耦合到APD的下侧。在示例性实施例中,通过晶体蚀刻在硅器件层中形成45°-55°的小面。在实施例中,APD包括硅倍增层,倍增层上方的锗吸收层以及设置在吸收层上方的多个欧姆接触。上面的光学反射金属膜将多个欧姆接触互连,并使围绕欧姆接触传输的光返回到吸收层,以提高检测器的响应度。

著录项

  • 公开/公告号US9761746B2

    专利类型

  • 公开/公告日2017-09-12

    原文格式PDF

  • 申请/专利权人 YIMIN KANG;HAN-DIN D. LIU;ANSHENG LIU;

    申请/专利号US201313976369

  • 发明设计人 YIMIN KANG;HAN-DIN D. LIU;ANSHENG LIU;

    申请日2013-03-11

  • 分类号H01S5/02;H01L31/107;H01L31/028;H01L31/0232;G02B6/26;H01L35/24;G02B6/12;H01L31/105;H01L31/18;

  • 国家 US

  • 入库时间 2022-08-21 13:48:16

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