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Optical mode analysis with design-based care areas

机译:具有基于设计的护理区域的光学模式分析

摘要

Methods and systems for selecting one or more modes of an inspection subsystem or system for inspection of a specimen are provided. The systems described herein are configured to acquire output for all of the modes to be considered at a location of a known defect on the specimen by aligning output, which is generated at the location with a mode known to generate output in which patterned features on the specimen are resolved to a degree that allows the output to be aligned to design data, with the design data for the specimen to identify the location with substantially high accuracy and then without moving the field of view of the inspection subsystem or system from that location, acquiring the output for all other modes. All of the acquired output can then be used to select mode(s) for inspection of the specimen or another specimen of the same type.
机译:提供了用于选择检查子系统或样本检查系统的一种或多种模式的方法和系统。本文中所描述的系统被配置为通过对准在样品上的已知缺陷的位置处获取的将要考虑的所有模式的输出来进行输出,该输出在该位置处以已知的模式生成以在该模式下生成其中图案上的图案化特征的输出。标本的解析度允许输出与设计数据对齐,标本的设计数据可以以很高的精度识别位置,然后无需从该位置移动检查子系统或系统的视野,获取所有其他模式的输出。然后,所有获取的输出都可以用于选择一种或多种模式,以检查样本或其他相同类型的样本。

著录项

  • 公开/公告号US9702827B1

    专利类型

  • 公开/公告日2017-07-11

    原文格式PDF

  • 申请/专利权人 KLA-TENCOR CORPORATION;

    申请/专利号US201514946604

  • 发明设计人 RAVIKUMAR SANAPALA;BJORN BRAUER;

    申请日2015-11-19

  • 分类号G01N21/00;G01N21/88;G01N21/95;

  • 国家 US

  • 入库时间 2022-08-21 13:47:07

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