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Peroxide-vapor treatment for enhancing photoresist-strip performance and modifying organic films
Peroxide-vapor treatment for enhancing photoresist-strip performance and modifying organic films
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机译:过氧化物蒸汽处理可增强光刻胶剥离性能并修饰有机膜
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摘要
Methods and apparatus for treating an organic film such as photoresist with a hydroxyl-generating compound prior to removing the organic film from a substrate are provided. Treatments include exposure to one or more of hydrogen peroxide vapor and water vapor in a non-plasma environment. In some implementations, conditions are such that condensation on the surface is suppressed. Methods include treating high-dose ion-implantation photoresists and post-plasma doping photoresists with little or no material loss and permit mild plasma removal of the photoresist after treatment.
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