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VACUUM ARC VAPORIZATION SOURCE, AND AN ARC VAPORIZATION CHAMBER WITH A VACUUM ARC VAPORIZATION SOURCE
VACUUM ARC VAPORIZATION SOURCE, AND AN ARC VAPORIZATION CHAMBER WITH A VACUUM ARC VAPORIZATION SOURCE
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机译:VACUUM ARC汽化源以及具有VACUUM ARC汽化源的ARC汽化室
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摘要
The vaporization source has a cathode body (3) including a vaporization material (31) as a cathode (32) for generation of arc discharge at a vaporization upper surface (33) of the cathode. The body is limited by a cathode base (34) in an axial direction, and by the surface in another axial direction. A circular magnetic field source (2) is arranged parallel or anti-parallel to a surface normal (300) of the surface, and concentric to the normal. A magnetic field reinforcement ring (4) is arranged in front of the base on a side turned away from the surface at a preset distance (A2).
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