METHOD OF PREPARING TRIBOELECTRIC FILM WITH INTAGLIATED, EMBOSSED OR DUAL EMBOSSED PATTERN, TRIBOELECTRIC FILM PREPARED THEREBY, AND HIGH-PERFORMANCE TRIBOELECTRIC NANOGENERATOR COMPRISING SAME

摘要

The present invention relates to a method for preparing a triboelectric film having an intagliated, embossed or dual embossed pattern on the basis of a colloid single-layer film formed by forced assembly on a substrate, a triboelectric film prepared thereby, and a high-performance triboelectric nanogenerator comprising the same. When applying a triboelectric film having an intagliated, embossed or dual embossed pattern prepared by the preparation method of the present invention to a triboelectric nanogenerator, it is possible to achieve not only excellent electrical performances, but also moisture resistance and high mechanical stability in a large scale.