首页> 外国专利> METHOD FOR FILLING VIA HOLE OF CERAMIC SUBSTRATE AND CERAMIC SUBSTRATE VIA HOLE FILLER FORMED THEREBY

METHOD FOR FILLING VIA HOLE OF CERAMIC SUBSTRATE AND CERAMIC SUBSTRATE VIA HOLE FILLER FORMED THEREBY

机译:一种通过陶瓷基质填充孔的方法以及通过其形成的孔填充器的陶瓷基质

摘要

The present invention relates to a method for filling a via hole of a ceramic substrate and a ceramic substrate via hole filler formed thereby. A via hole is formed on a ceramic substrate, a conductor is formed inside the via hole, and the conductor is then melted in a vacuum state and cooled again. As such, the via hole of the ceramic substrate can be simply filled with a conductor without a pore. Consequently, the ceramic substrate manufacturing process is simplified, manufacturing costs are reduced, the operating reliability of the ceramic substrate is improved, and stable operating reliability is ensured when used for a high-power semiconductor module.
机译:本发明涉及一种填充陶瓷基板的通孔的方法以及由此形成的陶瓷基板通孔填充剂。在陶瓷基板上形成通孔,在通孔的内部形成导体,然后在真空状态下将导体熔化并再次冷却。这样,可以用没有孔的导体简单地填充陶瓷基板的通孔。因此,当用于高功率半导体模块时,简化了陶瓷基板的制造工艺,降低了制造成本,提高了陶瓷基板的操作可靠性,并且确保了稳定的操作可靠性。

著录项

  • 公开/公告号WO2017155310A1

    专利类型

  • 公开/公告日2017-09-14

    原文格式PDF

  • 申请/专利权人 AMOSENSE CO. LTD.;

    申请/专利号WO2017KR02529

  • 申请日2017-03-08

  • 分类号H01L21/768;H01L21/48;H01L21/268;H01L21/02;H01L21/288;H01L21/285;

  • 国家 WO

  • 入库时间 2022-08-21 13:29:50

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