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METHOD FOR FILLING VIA HOLE OF CERAMIC SUBSTRATE AND CERAMIC SUBSTRATE VIA HOLE FILLER FORMED THEREBY
METHOD FOR FILLING VIA HOLE OF CERAMIC SUBSTRATE AND CERAMIC SUBSTRATE VIA HOLE FILLER FORMED THEREBY
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机译:一种通过陶瓷基质填充孔的方法以及通过其形成的孔填充器的陶瓷基质
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摘要
The present invention relates to a method for filling a via hole of a ceramic substrate and a ceramic substrate via hole filler formed thereby. A via hole is formed on a ceramic substrate, a conductor is formed inside the via hole, and the conductor is then melted in a vacuum state and cooled again. As such, the via hole of the ceramic substrate can be simply filled with a conductor without a pore. Consequently, the ceramic substrate manufacturing process is simplified, manufacturing costs are reduced, the operating reliability of the ceramic substrate is improved, and stable operating reliability is ensured when used for a high-power semiconductor module.
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