CVD- PVD- CVD OR PVD REACTOR FOR COATING LARGE-AREA SUBSTRATES

摘要

The present invention relates to a CVD (chemical vapor deposition) apparatus comprising a housing 1, 2 and a gas inlet member 7 with a gas outlet face 7 ', which is fixed to the housing 1, - or PVD-coating apparatus. The coating apparatus is provided with a deforming and temperature-stabilized holding apparatus (3) fixed to the upper section of the housing (1), in which the gas inflow member (7) 6 ', the holding device being formed by a holding frame comprising mechanical stabilizing elements (4, 5) and including vertical walls (4, 5) connected to each other at vertical connecting lines, At this time, the holding device 3 is fixed to the housing 1, 2 only at its horizontal edge 3 '. The gas inlet member 7 is fixed to the holding device 3 by a plurality of hanger 6 distributed over the entire horizontal extending surface. An actively cooled heat shield is located between the holding device 3 and the gas inflow member 7.