首页> 外国专利> LOW VOLTAGE AVALANCHE PHOTODIODE WITH RE-ENTRANT MIRROR FOR SILICON BASED PHOTONIC INTEGRATED CIRCUITS

LOW VOLTAGE AVALANCHE PHOTODIODE WITH RE-ENTRANT MIRROR FOR SILICON BASED PHOTONIC INTEGRATED CIRCUITS

机译:具有重入镜的低压雪崩光电二极管,用于硅基光子集成电路

摘要

A low voltage APD disposed at the end of a waveguide extending horizontally in a silicon device layer of a PIC chip is disclosed. The APD is disposed above the inverted concave mirror co-located at the end of the waveguide to connect the light by internal reflection down the APD from the waveguide. In an exemplary embodiment, a 45 ° -55 ° facet is formed in the silicon device layer by crystallographic etching. In an embodiment, the APD comprises a silicon-increasing layer, a germanium adsorption layer on the increasing layer, and a plurality of ohmic contacts disposed on the adsorption layer. The underlying optical reflective metal film interconnects a plurality of ohmic contacts and returns the transmitted light around the ohmic contact to the adsorbent layer for greater detector responsiveness.
机译:公开了一种低压APD,其设置在在PIC芯片的硅器件层中水平延伸的波导的端部。 APD设置在位于波导末端的倒置凹面镜上方,通过内部反射将光从波导向下沿APD进行连接。在示例性实施例中,通过晶体学蚀刻在硅器件层中形成45°-55°的小面。在一个实施例中,APD包括硅增加层,在增加层上的锗吸附层以及设置在吸附层上的多个欧姆接触。下方的光学反射金属膜将多个欧姆接触互连,并使围绕欧姆接触的透射光返回到吸附层,以提高检测器的响应速度。

著录项

  • 公开/公告号KR101691851B1

    专利类型

  • 公开/公告日2017-01-02

    原文格式PDF

  • 申请/专利权人 인텔 코포레이션;

    申请/专利号KR20157021579

  • 申请日2013-03-11

  • 分类号H01L31/107;H01L31/0232;H01L31/028;H01L31/105;H01L31/18;

  • 国家 KR

  • 入库时间 2022-08-21 13:26:20

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